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Sputtering Targets

We regularly offer highly pure Sputtering Targets especially as per the following listing

Sputtering Target

LIST OF SPUTTERING TARGETS

No.	Description	Diameter, inch	Thickness, mm +/-0.1 mm	Purity (better than)
1	Vanadium Pentoxide (V₂O₅), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.90%
2	Vanadium Oxide (VO), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.90%
3	Vanadium Dioxide (VO2), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.90%
4	Vanadium Trioxide (V2O3), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.90%
5	Aluminum Oxide (Al2O3), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.99%
6	Indium Tin Oxide (90-10 wt %), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.99%
7	Indium Oxide (In2O3), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.99%
8	Hafnium Oxide (HfO2), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.90%
9	Silicon Dioxide (SiO2), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.99%
10	Titanium Oxide (TiO2), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.95%
11	Molybdenum Oxide (MoO3), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.95%
12	Tungsten Oxide (WO3), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.90%
13	Tantalum Pentoxide (Ta2O5), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.95%

LIST OF SPUTTERING TARGETS

No.	Description	Diameter, inch	Thickness, mm +/-0.1 mm	Purity (better than)
14	Boron Carbide (B4C), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.95%
15	Silicon Nitride (Si3N4), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.50%
16	Silicon carbide (SiC), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.95%
17	Nickel Carbide (Ni3C), Targets with Copper backing plate of 2 mm thick with M2 threaded hole at the center	2	4	99.50%
18	Silver (Ag), Targets without backing plate	2	5	99.99%

LIST OF SPUTTERING TARGETS

No.	Description	Diameter, inch	Thickness, mm +/-0.1 mm	Purity (better than)
19	Aluminum (Al), Targets without backing plate	2	5	99.99%
20	Titanium (Ti), Targets without backing plate	2	5	99.99%
21	Molybdenum (Mo), Targets without backing plate	2	5	99.95%
22	Tungsten (W), Targets without backing plate	2	5	99.95%
23	Nichrome (NiCr) 80-20 wt %, Targets without backing plate	2	5	99.95%
24	Vanadium (V), Targets without backing plate	2	5	99.90%
25	Cobalt (Co), Targets without backing plate	2	5	99.95%
26	Carbon (C), Targets without backing plate	2	5	99.95%
27	Indium Tin (InSn) 90-10 wt%, Targets without backing plate	2	5	99.95%
28	Silicon (Si), Targets without backing plate	2	5	99.99%
29	Nickel (Ni), Targets without backing plate	2	5	99.99%
30	Chromium (Cr), Targets without backing plate	2	5	99.95%
31	Germanium (Ge), Targets without backing plate	2	5	99.99%
32	Niobium (Nb), Targets without backing plate	2	5	99.99%
33	Copper (Cu), Targets without backing plate	2	5	99.99%
34	Tin (Sn), Targets without backing plate	2	5	99.99%
35	Indium (In), Targets without backing plate	2	5	99.99%
36	Inconel 600, Targets without backing plate	2	5	99.50%

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